Relative performance specified in waves is worse at short UV wavelengths. For example, a lens used at 308nm will require an irregularity tolerance twice as tight as a lens used at 632.8nm to maintain the same relative level of wavefront distortion.

The deposition process requires more accurate monitoring, as small fluctuations in production results in much greater errors in the UV than they would in the visible or IR spectra.

Surface imperfections such as scratches and pits are amplified under UV light and small surface flaws can be points of absorption or scatter, reducing system throughput. In order to minimize energy loss, a tight surface quality specification is required.

The higher energy of UV radiation makes it more likely to cause multiphoton absorption, which can start a runaway process and damage the optical component.