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20-40nm, 50.8mm Dia, EUV/IR Dichroic Filter

Extreme Ultraviolet (EUV) Dichroic Filters

Extreme Ultraviolet (EUV) Dichroic Filters

Stock #18-280 New
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Diameter (mm):
Angle of Incidence (°):
Substrate: Many glass manufacturers offer the same material characteristics under different trade names. Learn More
Fused Silica (Corning 7980)
Dielectric Multilayer AR
Reflection (%):
Surface Quality:
Thickness (mm):
5.08 ±0.1
Dichroic Filter
Parallelism (arcmin):
Dimensional Tolerance (mm):
Wavelength Range (nm):
20 - 40
Surface Figure, RMS:
<λ/10 @ 633nm

Regulatory Compliance


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Product Family Description

  • Separates EUV from the NIR Laser Source in High Harmonic Generation
  • Designed for High Damage Thresholds
  • Supports Applications from 10 – 40nm
  • Available from Stock
  • No Minimum Order Quantities, No Coating Lot Charges

Extreme Ultraviolet (EUV) Dichroic Filters, also known as beam separators, are intended for high harmonic generation applications by providing a high separation efficiency between the EUV and NIR wavelengths. Featuring a Fused Silica substrate, these filters support higher laser powers than the alternative Brewster’s angle beam separators and EUV filters. EUV Dichroic Filters feature a broad bandwidth range from 10nm to 40nm. In addition to high harmonic generation, these filters can also be used in systems that support EUV applications such as EUV lithography, EUV nanomachining, coherent diffractive imaging, and ultrafast attosecond pulse generation.

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